Wafer-Scale Fabrication of Ultra-High Aspect Ratio, Microscale Silicon Structures with Smooth Sidewalls Using Metal Assisted Chemical Etching

Silicon structures with ultra-high aspect ratios have great potential applications in the fields of optoelectronics and biomedicine. However, the slope and increased roughness of the sidewalls inevitably introduced during the use of conventional etching processes (e.g., Bosch and DRIE) remain an obs...

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Detalles Bibliográficos
Autores principales: Zhang, Xiaomeng, Yao, Chuhao, Niu, Jiebin, Li, Hailiang, Xie, Changqing
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9865805/
https://www.ncbi.nlm.nih.gov/pubmed/36677239
http://dx.doi.org/10.3390/mi14010179

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9865805/
https://www.ncbi.nlm.nih.gov/pubmed/36677239
http://dx.doi.org/10.3390/mi14010179

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