3D Nanoprinting Replication Enhancement Using a Simulation-Informed Analytical Model for Electron Beam Exposure Dose Compensation

[Image: see text] 3D nanoprinting, using focused electron beam-induced deposition, is prone to a common structural artifact arising from a temperature gradient that naturally evolves during deposition, extending from the electron beam impact region (BIR) to the substrate. Inelastic electron energy l...

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Detalles Bibliográficos
Autores principales: Fowlkes, Jason D., Winkler, Robert, Rack, Philip D., Plank, Harald
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9878664/
https://www.ncbi.nlm.nih.gov/pubmed/36713724
http://dx.doi.org/10.1021/acsomega.2c06596

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9878664/
https://www.ncbi.nlm.nih.gov/pubmed/36713724
http://dx.doi.org/10.1021/acsomega.2c06596

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