Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO(2)

[Image: see text] The surface chemistry of the initial growth during the first or first few precursor cycles in atomic layer deposition is decisive for how the growth proceeds later on and thus for the quality of the thin films grown. Yet, although general schemes of the surface chemistry of atomic...

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Detalles Bibliográficos
Autores principales: D’Acunto, Giulio, Tsyshevsky, Roman, Shayesteh, Payam, Gallet, Jean-Jacques, Bournel, Fabrice, Rochet, François, Pinsard, Indiana, Timm, Rainer, Head, Ashley R., Kuklja, Maija, Schnadt, Joachim
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9879184/
https://www.ncbi.nlm.nih.gov/pubmed/36711051
http://dx.doi.org/10.1021/acs.chemmater.2c02947

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9879184/
https://www.ncbi.nlm.nih.gov/pubmed/36711051
http://dx.doi.org/10.1021/acs.chemmater.2c02947

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