Canny Algorithm Enabling Precise Offline Line Edge Roughness Acquisition in High-Resolution Lithography

[Image: see text] The line edge roughness (LER) is one of the most critical indicators of photoresist imaging performance, and its measurement using a reliable method is of great significance for lithography. However, most studies only investigate photoresist resolution and sensitivity because LER m...

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Detalles Bibliográficos
Autores principales: Hu, Ziyu, Zhao, Rongbo, Wang, Xiaolin, Tao, Peipei, Wang, Qianqian, Wang, Yimeng, Xu, Hong, He, Xiangming
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9893472/
https://www.ncbi.nlm.nih.gov/pubmed/36743030
http://dx.doi.org/10.1021/acsomega.2c06769

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9893472/
https://www.ncbi.nlm.nih.gov/pubmed/36743030
http://dx.doi.org/10.1021/acsomega.2c06769

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