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Canny Algorithm Enabling Precise Offline Line Edge Roughness Acquisition in High-Resolution Lithography
[Image: see text] The line edge roughness (LER) is one of the most critical indicators of photoresist imaging performance, and its measurement using a reliable method is of great significance for lithography. However, most studies only investigate photoresist resolution and sensitivity because LER m...
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2023
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9893472/ https://www.ncbi.nlm.nih.gov/pubmed/36743030 http://dx.doi.org/10.1021/acsomega.2c06769 |