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Improvement of Resistance Change Memory Characteristics in Ferroelectric and Antiferroelectric (like) Parallel Structures
Recently, considerable attention has been paid to the development of advanced technologies such as artificial intelligence (AI) and big data, and high-density, high-speed storage devices are being extensively studied to realize the technology. Ferroelectrics are promising non-volatile memory materia...
Autores principales: | Kho, Wonwoo, Hwang, Hyunjoo, Kim, Jisoo, Park, Gyuil, Ahn, Seung-Eon |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9918946/ https://www.ncbi.nlm.nih.gov/pubmed/36770400 http://dx.doi.org/10.3390/nano13030439 |
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