Dispersion and Polishing Mechanism of a Novel CeO(2)-LaOF-Based Chemical Mechanical Polishing Slurry for Quartz Glass

Quartz glass shows superior physicochemical properties and is used in modern high technology. Due to its hard and brittle characteristics, traditional polishing slurry mostly uses strong acid, strong alkali, and potent corrosive additives, which cause environmental pollution. Furthermore, the degree...

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Detalles Bibliográficos
Autores principales: Zhao, Zifeng, Zhang, Zhenyu, Shi, Chunjing, Feng, Junyuan, Zhuang, Xuye, Li, Li, Meng, Fanning, Li, Haodong, Xue, Zihang, Liu, Dongdong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9920658/
https://www.ncbi.nlm.nih.gov/pubmed/36770160
http://dx.doi.org/10.3390/ma16031148

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9920658/
https://www.ncbi.nlm.nih.gov/pubmed/36770160
http://dx.doi.org/10.3390/ma16031148

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