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Dispersion and Polishing Mechanism of a Novel CeO(2)-LaOF-Based Chemical Mechanical Polishing Slurry for Quartz Glass
Quartz glass shows superior physicochemical properties and is used in modern high technology. Due to its hard and brittle characteristics, traditional polishing slurry mostly uses strong acid, strong alkali, and potent corrosive additives, which cause environmental pollution. Furthermore, the degree...
Autores principales: | , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9920658/ https://www.ncbi.nlm.nih.gov/pubmed/36770160 http://dx.doi.org/10.3390/ma16031148 |