Reliability Characteristics of Metal-Insulator-Semiconductor Capacitors with Low-Dielectric-Constant Materials

In this study, the reliability characteristics of metal-insulator-semiconductor (MIS) capacitor structures with low-dielectric-constant (low-k) materials have been investigated in terms of metal gate area and geometry and thickness of dielectric film effects. Two low-k materials, dense and porous lo...

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Detalles Bibliográficos
Autores principales: Cheng, Yi-Lung, Peng, Wei-Fan, Huang, Chi-Jia, Chen, Giin-Shan, Fang, Jau-Shiung
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9920685/
https://www.ncbi.nlm.nih.gov/pubmed/36770801
http://dx.doi.org/10.3390/molecules28031134

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9920685/
https://www.ncbi.nlm.nih.gov/pubmed/36770801
http://dx.doi.org/10.3390/molecules28031134

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