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Reliability Characteristics of Metal-Insulator-Semiconductor Capacitors with Low-Dielectric-Constant Materials

In this study, the reliability characteristics of metal-insulator-semiconductor (MIS) capacitor structures with low-dielectric-constant (low-k) materials have been investigated in terms of metal gate area and geometry and thickness of dielectric film effects. Two low-k materials, dense and porous lo...

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Detalles Bibliográficos
Autores principales:	Cheng, Yi-Lung, Peng, Wei-Fan, Huang, Chi-Jia, Chen, Giin-Shan, Fang, Jau-Shiung
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2023
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9920685/ https://www.ncbi.nlm.nih.gov/pubmed/36770801 http://dx.doi.org/10.3390/molecules28031134

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