Tribochemical nanolithography: selective mechanochemical removal of photocleavable nitrophenyl protecting groups with 23 nm resolution at speeds of up to 1 mm s(−1)

We describe the mechanochemical regulation of a reaction that would otherwise be considered to be photochemical, via a simple process that yields nm spatial resolution. An atomic force microscope (AFM) probe is used to remove photocleavable nitrophenyl protecting groups from alkylsilane films at loa...

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Detalles Bibliográficos
Autores principales: Ducker, Robert E., Brügge, Oscar Siles, Meijer, Anthony J. H. M., Leggett, Graham J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2023
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9931061/
https://www.ncbi.nlm.nih.gov/pubmed/36819865
http://dx.doi.org/10.1039/d2sc06305k

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9931061/
https://www.ncbi.nlm.nih.gov/pubmed/36819865
http://dx.doi.org/10.1039/d2sc06305k

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