Thermal Atomic Layer Etching of MoS(2) Using MoF(6) and H(2)O

[Image: see text] Two-dimensional (2D) layered materials offer unique properties that make them attractive for continued scaling in electronic and optoelectronic device applications. Successful integration of 2D materials into semiconductor manufacturing requires high-volume and high-precision proce...

Descripción completa

Detalles Bibliográficos
Autores principales: Soares, Jake, Mane, Anil U., Choudhury, Devika, Letourneau, Steven, Hues, Steven M., Elam, Jeffrey W., Graugnard, Elton
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9933903/
https://www.ncbi.nlm.nih.gov/pubmed/36818590
http://dx.doi.org/10.1021/acs.chemmater.2c02549

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9933903/
https://www.ncbi.nlm.nih.gov/pubmed/36818590
http://dx.doi.org/10.1021/acs.chemmater.2c02549

Ejemplares similares