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Analog Resistive Switching and Artificial Synaptic Behavior of ITO/WO(X)/TaN Memristors
In this work, we fabricated an ITO/WO(X)/TaN memristor device by reactive sputtering to investigate resistive switching and conduct analog resistive switching to implement artificial synaptic devices. The device showed good pulse endurance (10(4) cycles), a high on/off ratio (>10), and long reten...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9961236/ https://www.ncbi.nlm.nih.gov/pubmed/36837316 http://dx.doi.org/10.3390/ma16041687 |
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author | Cho, Youngboo Kim, Jihyung Kang, Myounggon Kim, Sungjun |
author_facet | Cho, Youngboo Kim, Jihyung Kang, Myounggon Kim, Sungjun |
author_sort | Cho, Youngboo |
collection | PubMed |
description | In this work, we fabricated an ITO/WO(X)/TaN memristor device by reactive sputtering to investigate resistive switching and conduct analog resistive switching to implement artificial synaptic devices. The device showed good pulse endurance (10(4) cycles), a high on/off ratio (>10), and long retention (>10(4) s) at room temperature. The conduction mechanism could be explained by Schottky emission conduction. Further, the resistive switching characteristics were performed by additional pulse-signal-based experiments for more practical operation. Lastly, the potentiation/depression characteristics were examined for 10 cycles. The results thus indicate that the WO(X)-based devices are appropriate candidates for synaptic devices as well as next-generation nonvolatile memory. |
format | Online Article Text |
id | pubmed-9961236 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2023 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-99612362023-02-26 Analog Resistive Switching and Artificial Synaptic Behavior of ITO/WO(X)/TaN Memristors Cho, Youngboo Kim, Jihyung Kang, Myounggon Kim, Sungjun Materials (Basel) Article In this work, we fabricated an ITO/WO(X)/TaN memristor device by reactive sputtering to investigate resistive switching and conduct analog resistive switching to implement artificial synaptic devices. The device showed good pulse endurance (10(4) cycles), a high on/off ratio (>10), and long retention (>10(4) s) at room temperature. The conduction mechanism could be explained by Schottky emission conduction. Further, the resistive switching characteristics were performed by additional pulse-signal-based experiments for more practical operation. Lastly, the potentiation/depression characteristics were examined for 10 cycles. The results thus indicate that the WO(X)-based devices are appropriate candidates for synaptic devices as well as next-generation nonvolatile memory. MDPI 2023-02-17 /pmc/articles/PMC9961236/ /pubmed/36837316 http://dx.doi.org/10.3390/ma16041687 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Cho, Youngboo Kim, Jihyung Kang, Myounggon Kim, Sungjun Analog Resistive Switching and Artificial Synaptic Behavior of ITO/WO(X)/TaN Memristors |
title | Analog Resistive Switching and Artificial Synaptic Behavior of ITO/WO(X)/TaN Memristors |
title_full | Analog Resistive Switching and Artificial Synaptic Behavior of ITO/WO(X)/TaN Memristors |
title_fullStr | Analog Resistive Switching and Artificial Synaptic Behavior of ITO/WO(X)/TaN Memristors |
title_full_unstemmed | Analog Resistive Switching and Artificial Synaptic Behavior of ITO/WO(X)/TaN Memristors |
title_short | Analog Resistive Switching and Artificial Synaptic Behavior of ITO/WO(X)/TaN Memristors |
title_sort | analog resistive switching and artificial synaptic behavior of ito/wo(x)/tan memristors |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9961236/ https://www.ncbi.nlm.nih.gov/pubmed/36837316 http://dx.doi.org/10.3390/ma16041687 |
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