Enhancement of the Surface Morphology of (Bi(0.4)Sb(0.6))(2)Te(3) Thin Films by In Situ Thermal Annealing

The study of the exotic properties of the surface states of topological insulators requires defect-free and smooth surfaces. This work aims to study the enhancement of the surface morphology of optimally doped, high-crystalline (Bi(0.4)Sb(0.6))(2)Te(3) films deposited by molecular beam epitaxy on Al...

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Detalles Bibliográficos
Autores principales: Mulder, Liesbeth, van de Glind, Hanne, Brinkman, Alexander, Concepción, Omar
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9961334/
https://www.ncbi.nlm.nih.gov/pubmed/36839131
http://dx.doi.org/10.3390/nano13040763
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author Mulder, Liesbeth
van de Glind, Hanne
Brinkman, Alexander
Concepción, Omar
author_facet Mulder, Liesbeth
van de Glind, Hanne
Brinkman, Alexander
Concepción, Omar
author_sort Mulder, Liesbeth
collection PubMed
description The study of the exotic properties of the surface states of topological insulators requires defect-free and smooth surfaces. This work aims to study the enhancement of the surface morphology of optimally doped, high-crystalline (Bi(0.4)Sb(0.6))(2)Te(3) films deposited by molecular beam epitaxy on Al(2)O(3) (001) substrates. Atomic force microscopy shows that by employing an in situ thermal post anneal, the surface roughness is reduced significantly, and transmission electron microscopy reveals that structural defects are diminished substantially. Thence, these films provide a great platform for the research on the thickness-dependent properties of topological insulators.
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spelling pubmed-99613342023-02-26 Enhancement of the Surface Morphology of (Bi(0.4)Sb(0.6))(2)Te(3) Thin Films by In Situ Thermal Annealing Mulder, Liesbeth van de Glind, Hanne Brinkman, Alexander Concepción, Omar Nanomaterials (Basel) Article The study of the exotic properties of the surface states of topological insulators requires defect-free and smooth surfaces. This work aims to study the enhancement of the surface morphology of optimally doped, high-crystalline (Bi(0.4)Sb(0.6))(2)Te(3) films deposited by molecular beam epitaxy on Al(2)O(3) (001) substrates. Atomic force microscopy shows that by employing an in situ thermal post anneal, the surface roughness is reduced significantly, and transmission electron microscopy reveals that structural defects are diminished substantially. Thence, these films provide a great platform for the research on the thickness-dependent properties of topological insulators. MDPI 2023-02-17 /pmc/articles/PMC9961334/ /pubmed/36839131 http://dx.doi.org/10.3390/nano13040763 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Mulder, Liesbeth
van de Glind, Hanne
Brinkman, Alexander
Concepción, Omar
Enhancement of the Surface Morphology of (Bi(0.4)Sb(0.6))(2)Te(3) Thin Films by In Situ Thermal Annealing
title Enhancement of the Surface Morphology of (Bi(0.4)Sb(0.6))(2)Te(3) Thin Films by In Situ Thermal Annealing
title_full Enhancement of the Surface Morphology of (Bi(0.4)Sb(0.6))(2)Te(3) Thin Films by In Situ Thermal Annealing
title_fullStr Enhancement of the Surface Morphology of (Bi(0.4)Sb(0.6))(2)Te(3) Thin Films by In Situ Thermal Annealing
title_full_unstemmed Enhancement of the Surface Morphology of (Bi(0.4)Sb(0.6))(2)Te(3) Thin Films by In Situ Thermal Annealing
title_short Enhancement of the Surface Morphology of (Bi(0.4)Sb(0.6))(2)Te(3) Thin Films by In Situ Thermal Annealing
title_sort enhancement of the surface morphology of (bi(0.4)sb(0.6))(2)te(3) thin films by in situ thermal annealing
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9961334/
https://www.ncbi.nlm.nih.gov/pubmed/36839131
http://dx.doi.org/10.3390/nano13040763
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