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A 21.4 pW Subthreshold Voltage Reference with 0.020 %/V Line Sensitivity Using DIBL Compensation
This paper presents an ultra-low-power voltage reference designed in 180 nm CMOS technology. To achieve near-zero line sensitivity, a two-transistor (2-T) voltage reference is biased with a current source to cancel the drain-induced barrier-lowering (DIBL) effect of the 2-T core, thus improving the...
Autores principales: | , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9963272/ https://www.ncbi.nlm.nih.gov/pubmed/36850459 http://dx.doi.org/10.3390/s23041862 |
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author | Colbach, Louis Jang, Taekwang Ji, Youngwoo |
author_facet | Colbach, Louis Jang, Taekwang Ji, Youngwoo |
author_sort | Colbach, Louis |
collection | PubMed |
description | This paper presents an ultra-low-power voltage reference designed in 180 nm CMOS technology. To achieve near-zero line sensitivity, a two-transistor (2-T) voltage reference is biased with a current source to cancel the drain-induced barrier-lowering (DIBL) effect of the 2-T core, thus improving the line sensitivity. This compensation circuit achieves a Monte-Carlo-simulated line sensitivity of 0.035 %/V in a supply range of 0.6 to 1.8 V, while generating a reference voltage of 307.8 mV, with 21.4 pW power consumption. The simulated power supply rejection ratio (PSRR) is −54 dB at 100 Hz. It also achieves a temperature coefficient of 24.8 ppm/°C in a temperature range of −20 to 80 °C, with a projected area of 0.003 mm(2). |
format | Online Article Text |
id | pubmed-9963272 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2023 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-99632722023-02-26 A 21.4 pW Subthreshold Voltage Reference with 0.020 %/V Line Sensitivity Using DIBL Compensation Colbach, Louis Jang, Taekwang Ji, Youngwoo Sensors (Basel) Article This paper presents an ultra-low-power voltage reference designed in 180 nm CMOS technology. To achieve near-zero line sensitivity, a two-transistor (2-T) voltage reference is biased with a current source to cancel the drain-induced barrier-lowering (DIBL) effect of the 2-T core, thus improving the line sensitivity. This compensation circuit achieves a Monte-Carlo-simulated line sensitivity of 0.035 %/V in a supply range of 0.6 to 1.8 V, while generating a reference voltage of 307.8 mV, with 21.4 pW power consumption. The simulated power supply rejection ratio (PSRR) is −54 dB at 100 Hz. It also achieves a temperature coefficient of 24.8 ppm/°C in a temperature range of −20 to 80 °C, with a projected area of 0.003 mm(2). MDPI 2023-02-07 /pmc/articles/PMC9963272/ /pubmed/36850459 http://dx.doi.org/10.3390/s23041862 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Colbach, Louis Jang, Taekwang Ji, Youngwoo A 21.4 pW Subthreshold Voltage Reference with 0.020 %/V Line Sensitivity Using DIBL Compensation |
title | A 21.4 pW Subthreshold Voltage Reference with 0.020 %/V Line Sensitivity Using DIBL Compensation |
title_full | A 21.4 pW Subthreshold Voltage Reference with 0.020 %/V Line Sensitivity Using DIBL Compensation |
title_fullStr | A 21.4 pW Subthreshold Voltage Reference with 0.020 %/V Line Sensitivity Using DIBL Compensation |
title_full_unstemmed | A 21.4 pW Subthreshold Voltage Reference with 0.020 %/V Line Sensitivity Using DIBL Compensation |
title_short | A 21.4 pW Subthreshold Voltage Reference with 0.020 %/V Line Sensitivity Using DIBL Compensation |
title_sort | 21.4 pw subthreshold voltage reference with 0.020 %/v line sensitivity using dibl compensation |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9963272/ https://www.ncbi.nlm.nih.gov/pubmed/36850459 http://dx.doi.org/10.3390/s23041862 |
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