Using machine learning with optical profilometry for GaN wafer screening

To improve the manufacturing process of GaN wafers, inexpensive wafer screening techniques are required to both provide feedback to the manufacturing process and prevent fabrication on low quality or defective wafers, thus reducing costs resulting from wasted processing effort. Many of the wafer sca...

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Detalles Bibliográficos
Autores principales: Gallagher, James C., Mastro, Michael A., Ebrish, Mona A., Jacobs, Alan G., Gunning, Brendan P., Kaplar, Robert J., Hobart, Karl D., Anderson, Travis J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9971037/
https://www.ncbi.nlm.nih.gov/pubmed/36849490
http://dx.doi.org/10.1038/s41598-023-29107-9

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9971037/
https://www.ncbi.nlm.nih.gov/pubmed/36849490
http://dx.doi.org/10.1038/s41598-023-29107-9

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