Development of controlled nanosphere lithography technology

This work is devoted to the development of nanosphere lithography (NSL) technology, which is a low-cost and efficient method to form nanostructures for nanoelectronics, as well as optoelectronic, plasmonic and photovoltaic applications. Creating a nanosphere mask by spin-coating is a promising, but...

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Detalles Bibliográficos
Autores principales: Osipov, Artem A., Gagaeva, Alina E., Speshilova, Anastasiya B., Endiiarova, Ekaterina V., Bespalova, Polina G., Osipov, Armenak A., Belyanov, Ilya A., Tyurikov, Kirill S., Tyurikova, Irina A., Alexandrov, Sergey E.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9971052/
https://www.ncbi.nlm.nih.gov/pubmed/36849515
http://dx.doi.org/10.1038/s41598-023-29077-y

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9971052/
https://www.ncbi.nlm.nih.gov/pubmed/36849515
http://dx.doi.org/10.1038/s41598-023-29077-y

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